Back in Sep, Shanghai reported that "SMEE made breakthroughs in 90-nm lithography machines" globaltimes.cn. Some thought this was SSA600, but I don't. SMEE likely abandoned SSX600 and was moving to SSX800. New series would range from iLine to DUVi scanner. Back in July,
Li Yi (former MIIT official) said that SMEE's 28nm scanner landed in 2021. That was a relief for people following Project 02. SSX800 was designed to be competitive as you can see with comparison table to ASML/Canon. 1 iLine scanner has been delivered, but it still lacks features
But SMEE focus was Arf. SSA800 was designed to be dual wafer scanning to have comparable WPS to ASML scanners. SSA800 dry is suppose to be very similar to ASML dry scanners. The news of achieving breakthrough was good news. Recently, it's rumored to have entered "mass production"
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