HOWEVER, unlike many claimed online, this technology is still at least 5 years away.
China's upcoming EUV lithography machines still uses the traditional LPP EUV light source, same as ASML.
When optimized, the SSMB method can be more efficient and versatile.
China's upcoming EUV lithography machines still uses the traditional LPP EUV light source, same as ASML.
When optimized, the SSMB method can be more efficient and versatile.
Loading suggestions...